Hard masks for block patterning

Embodiments are directed to a method of forming a semiconductor device and resulting structures having a hard masks for sidewall image transfer (SIT) block patterning. The method includes forming a first hard mask on a substrate. Spacers are formed on the first hard mask, and a second hard mask is f...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Xu, Yongan, Seshadri, Indira P. V, De Silva, Ekmini A, Estrada-Raygoza, Isabel C, Mignot, Yann A. M
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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