Lithographic apparatus and method
A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body...
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creator | Van Boxtel, Frank Johannes Jacobus Sosniak, Lukasz Van Der Pasch, Engelbertus Antonius Fransiscus Nakiboglu, Günes Cosijns, Suzanne Johanna Antonetta Geertruda Quist, Anne Willemijn Bertine |
description | A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10345717B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10345717B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10345717B23</originalsourceid><addsrcrecordid>eNrjZFD0ySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1HITQVKpfAwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUkvjQYEMDYxNTc0NzJyNjYtQAAJr9Jfc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and method</title><source>esp@cenet</source><creator>Van Boxtel, Frank Johannes Jacobus ; Sosniak, Lukasz ; Van Der Pasch, Engelbertus Antonius Fransiscus ; Nakiboglu, Günes ; Cosijns, Suzanne Johanna Antonetta Geertruda ; Quist, Anne Willemijn Bertine</creator><creatorcontrib>Van Boxtel, Frank Johannes Jacobus ; Sosniak, Lukasz ; Van Der Pasch, Engelbertus Antonius Fransiscus ; Nakiboglu, Günes ; Cosijns, Suzanne Johanna Antonetta Geertruda ; Quist, Anne Willemijn Bertine</creatorcontrib><description>A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190709&DB=EPODOC&CC=US&NR=10345717B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190709&DB=EPODOC&CC=US&NR=10345717B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Van Boxtel, Frank Johannes Jacobus</creatorcontrib><creatorcontrib>Sosniak, Lukasz</creatorcontrib><creatorcontrib>Van Der Pasch, Engelbertus Antonius Fransiscus</creatorcontrib><creatorcontrib>Nakiboglu, Günes</creatorcontrib><creatorcontrib>Cosijns, Suzanne Johanna Antonetta Geertruda</creatorcontrib><creatorcontrib>Quist, Anne Willemijn Bertine</creatorcontrib><title>Lithographic apparatus and method</title><description>A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD0ySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1HITQVKpfAwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUkvjQYEMDYxNTc0NzJyNjYtQAAJr9Jfc</recordid><startdate>20190709</startdate><enddate>20190709</enddate><creator>Van Boxtel, Frank Johannes Jacobus</creator><creator>Sosniak, Lukasz</creator><creator>Van Der Pasch, Engelbertus Antonius Fransiscus</creator><creator>Nakiboglu, Günes</creator><creator>Cosijns, Suzanne Johanna Antonetta Geertruda</creator><creator>Quist, Anne Willemijn Bertine</creator><scope>EVB</scope></search><sort><creationdate>20190709</creationdate><title>Lithographic apparatus and method</title><author>Van Boxtel, Frank Johannes Jacobus ; Sosniak, Lukasz ; Van Der Pasch, Engelbertus Antonius Fransiscus ; Nakiboglu, Günes ; Cosijns, Suzanne Johanna Antonetta Geertruda ; Quist, Anne Willemijn Bertine</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10345717B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Van Boxtel, Frank Johannes Jacobus</creatorcontrib><creatorcontrib>Sosniak, Lukasz</creatorcontrib><creatorcontrib>Van Der Pasch, Engelbertus Antonius Fransiscus</creatorcontrib><creatorcontrib>Nakiboglu, Günes</creatorcontrib><creatorcontrib>Cosijns, Suzanne Johanna Antonetta Geertruda</creatorcontrib><creatorcontrib>Quist, Anne Willemijn Bertine</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Van Boxtel, Frank Johannes Jacobus</au><au>Sosniak, Lukasz</au><au>Van Der Pasch, Engelbertus Antonius Fransiscus</au><au>Nakiboglu, Günes</au><au>Cosijns, Suzanne Johanna Antonetta Geertruda</au><au>Quist, Anne Willemijn Bertine</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and method</title><date>2019-07-09</date><risdate>2019</risdate><abstract>A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | Lithographic apparatus and method |
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