Absorbing reflector for semiconductor processing chamber
Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the proces...
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| creator | Kuppurao, Satheesh Ramachandran, Balasubramanian Mack, James Francis Redfield, Daniel Halpin, Richard Olsen, Michael Lo, Kin Pong Ranish, Joseph M Vetorino, Brett Brillhart, Paul Patalay, Kailash Kiran Feigel, Eddie |
| description | Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support. |
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In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190528&DB=EPODOC&CC=US&NR=10306708B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190528&DB=EPODOC&CC=US&NR=10306708B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Kuppurao, Satheesh</creatorcontrib><creatorcontrib>Ramachandran, Balasubramanian</creatorcontrib><creatorcontrib>Mack, James Francis</creatorcontrib><creatorcontrib>Redfield, Daniel</creatorcontrib><creatorcontrib>Halpin, Richard</creatorcontrib><creatorcontrib>Olsen, Michael</creatorcontrib><creatorcontrib>Lo, Kin Pong</creatorcontrib><creatorcontrib>Ranish, Joseph M</creatorcontrib><creatorcontrib>Vetorino, Brett</creatorcontrib><creatorcontrib>Brillhart, Paul</creatorcontrib><creatorcontrib>Patalay, Kailash Kiran</creatorcontrib><creatorcontrib>Feigel, Eddie</creatorcontrib><title>Absorbing reflector for semiconductor processing chamber</title><description>Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. 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In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SEMICONDUCTOR DEVICES |
| title | Absorbing reflector for semiconductor processing chamber |
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