Semiconductor device and method of manufacturing the same

Provided is a semiconductor device including an active region provided in a first conductivity type semiconductor layer and a termination region provided around the active region. A MOS transistor through which a main current flows in a thickness direction of the semiconductor layer is formed in the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Yutani, Naoki, Ebiike, Yuji
Format: Patent
Sprache:eng
Schlagworte:
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