Heat dissipative element for polysilicon resistor bank

An integrated circuit (IC) structure is disclosed. The structure can include: a first heat dissipative element disposed between a pair of shallow trench isolations (STIs) in a substrate, and a first polysilicon resistor in a polysilicon layer positioned over the substrate and the pair of STIs, the f...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Gerhardt, Martin, Mikalo, Ricardo P
Format: Patent
Sprache:eng
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