Lithographic apparatus and device manufacturing method
A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of...
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| creator | Teunissen, Franciscus Johannes Herman Maria Van Der Net, Antonius Johannus Tinnemans, Patricius Aloysius Jacobus Verspay, Jacobus Johannus Leonardus Hendricus Verhagen, Martinus Cornelis Maria Mertens, Jeroen Johannes Sophia Maria De Graaf, Roelof Frederik Van Gompel, Edwin Augustinus Matheus Hoogendam, Christiaan Alexander Donders, Sjoerd Nicolaas Lambertus |
| description | A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10248033B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10248033B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10248033B23</originalsourceid><addsrcrecordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYYGRiYWBsbGTkbGxKgBANhnLiI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and device manufacturing method</title><source>esp@cenet</source><creator>Teunissen, Franciscus Johannes Herman Maria ; Van Der Net, Antonius Johannus ; Tinnemans, Patricius Aloysius Jacobus ; Verspay, Jacobus Johannus Leonardus Hendricus ; Verhagen, Martinus Cornelis Maria ; Mertens, Jeroen Johannes Sophia Maria ; De Graaf, Roelof Frederik ; Van Gompel, Edwin Augustinus Matheus ; Hoogendam, Christiaan Alexander ; Donders, Sjoerd Nicolaas Lambertus</creator><creatorcontrib>Teunissen, Franciscus Johannes Herman Maria ; Van Der Net, Antonius Johannus ; Tinnemans, Patricius Aloysius Jacobus ; Verspay, Jacobus Johannus Leonardus Hendricus ; Verhagen, Martinus Cornelis Maria ; Mertens, Jeroen Johannes Sophia Maria ; De Graaf, Roelof Frederik ; Van Gompel, Edwin Augustinus Matheus ; Hoogendam, Christiaan Alexander ; Donders, Sjoerd Nicolaas Lambertus</creatorcontrib><description>A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190402&DB=EPODOC&CC=US&NR=10248033B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190402&DB=EPODOC&CC=US&NR=10248033B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Teunissen, Franciscus Johannes Herman Maria</creatorcontrib><creatorcontrib>Van Der Net, Antonius Johannus</creatorcontrib><creatorcontrib>Tinnemans, Patricius Aloysius Jacobus</creatorcontrib><creatorcontrib>Verspay, Jacobus Johannus Leonardus Hendricus</creatorcontrib><creatorcontrib>Verhagen, Martinus Cornelis Maria</creatorcontrib><creatorcontrib>Mertens, Jeroen Johannes Sophia Maria</creatorcontrib><creatorcontrib>De Graaf, Roelof Frederik</creatorcontrib><creatorcontrib>Van Gompel, Edwin Augustinus Matheus</creatorcontrib><creatorcontrib>Hoogendam, Christiaan Alexander</creatorcontrib><creatorcontrib>Donders, Sjoerd Nicolaas Lambertus</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYYGRiYWBsbGTkbGxKgBANhnLiI</recordid><startdate>20190402</startdate><enddate>20190402</enddate><creator>Teunissen, Franciscus Johannes Herman Maria</creator><creator>Van Der Net, Antonius Johannus</creator><creator>Tinnemans, Patricius Aloysius Jacobus</creator><creator>Verspay, Jacobus Johannus Leonardus Hendricus</creator><creator>Verhagen, Martinus Cornelis Maria</creator><creator>Mertens, Jeroen Johannes Sophia Maria</creator><creator>De Graaf, Roelof Frederik</creator><creator>Van Gompel, Edwin Augustinus Matheus</creator><creator>Hoogendam, Christiaan Alexander</creator><creator>Donders, Sjoerd Nicolaas Lambertus</creator><scope>EVB</scope></search><sort><creationdate>20190402</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>Teunissen, Franciscus Johannes Herman Maria ; Van Der Net, Antonius Johannus ; Tinnemans, Patricius Aloysius Jacobus ; Verspay, Jacobus Johannus Leonardus Hendricus ; Verhagen, Martinus Cornelis Maria ; Mertens, Jeroen Johannes Sophia Maria ; De Graaf, Roelof Frederik ; Van Gompel, Edwin Augustinus Matheus ; Hoogendam, Christiaan Alexander ; Donders, Sjoerd Nicolaas Lambertus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10248033B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Teunissen, Franciscus Johannes Herman Maria</creatorcontrib><creatorcontrib>Van Der Net, Antonius Johannus</creatorcontrib><creatorcontrib>Tinnemans, Patricius Aloysius Jacobus</creatorcontrib><creatorcontrib>Verspay, Jacobus Johannus Leonardus Hendricus</creatorcontrib><creatorcontrib>Verhagen, Martinus Cornelis Maria</creatorcontrib><creatorcontrib>Mertens, Jeroen Johannes Sophia Maria</creatorcontrib><creatorcontrib>De Graaf, Roelof Frederik</creatorcontrib><creatorcontrib>Van Gompel, Edwin Augustinus Matheus</creatorcontrib><creatorcontrib>Hoogendam, Christiaan Alexander</creatorcontrib><creatorcontrib>Donders, Sjoerd Nicolaas Lambertus</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Teunissen, Franciscus Johannes Herman Maria</au><au>Van Der Net, Antonius Johannus</au><au>Tinnemans, Patricius Aloysius Jacobus</au><au>Verspay, Jacobus Johannus Leonardus Hendricus</au><au>Verhagen, Martinus Cornelis Maria</au><au>Mertens, Jeroen Johannes Sophia Maria</au><au>De Graaf, Roelof Frederik</au><au>Van Gompel, Edwin Augustinus Matheus</au><au>Hoogendam, Christiaan Alexander</au><au>Donders, Sjoerd Nicolaas Lambertus</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2019-04-02</date><risdate>2019</risdate><abstract>A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and device manufacturing method |
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