Projection system
A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a s...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Van Schoot, Jan Bernard Plechelmus De Jongh, Robertus Johannes Marinus Merkx, Leon Leonardus Franciscus Merry, Roel Johannes Elisabeth Knops, Raoul Maarten Simon Simons, Wilhelmus Franciscus Johannes Butler, Hans Ypma, Michael Frederik Streefkerk, Bob Valentin, Christiaan Louis |
| description | A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10248027B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10248027B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10248027B23</originalsourceid><addsrcrecordid>eNrjZBAMKMrPSk0uyczPUyiuLC5JzeVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYYGRiYWBkbmTkbGxKgBAO35H_4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Projection system</title><source>esp@cenet</source><creator>Van Schoot, Jan Bernard Plechelmus ; De Jongh, Robertus Johannes Marinus ; Merkx, Leon Leonardus Franciscus ; Merry, Roel Johannes Elisabeth ; Knops, Raoul Maarten Simon ; Simons, Wilhelmus Franciscus Johannes ; Butler, Hans ; Ypma, Michael Frederik ; Streefkerk, Bob ; Valentin, Christiaan Louis</creator><creatorcontrib>Van Schoot, Jan Bernard Plechelmus ; De Jongh, Robertus Johannes Marinus ; Merkx, Leon Leonardus Franciscus ; Merry, Roel Johannes Elisabeth ; Knops, Raoul Maarten Simon ; Simons, Wilhelmus Franciscus Johannes ; Butler, Hans ; Ypma, Michael Frederik ; Streefkerk, Bob ; Valentin, Christiaan Louis</creatorcontrib><description>A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190402&DB=EPODOC&CC=US&NR=10248027B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190402&DB=EPODOC&CC=US&NR=10248027B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Van Schoot, Jan Bernard Plechelmus</creatorcontrib><creatorcontrib>De Jongh, Robertus Johannes Marinus</creatorcontrib><creatorcontrib>Merkx, Leon Leonardus Franciscus</creatorcontrib><creatorcontrib>Merry, Roel Johannes Elisabeth</creatorcontrib><creatorcontrib>Knops, Raoul Maarten Simon</creatorcontrib><creatorcontrib>Simons, Wilhelmus Franciscus Johannes</creatorcontrib><creatorcontrib>Butler, Hans</creatorcontrib><creatorcontrib>Ypma, Michael Frederik</creatorcontrib><creatorcontrib>Streefkerk, Bob</creatorcontrib><creatorcontrib>Valentin, Christiaan Louis</creatorcontrib><title>Projection system</title><description>A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAMKMrPSk0uyczPUyiuLC5JzeVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYYGRiYWBkbmTkbGxKgBAO35H_4</recordid><startdate>20190402</startdate><enddate>20190402</enddate><creator>Van Schoot, Jan Bernard Plechelmus</creator><creator>De Jongh, Robertus Johannes Marinus</creator><creator>Merkx, Leon Leonardus Franciscus</creator><creator>Merry, Roel Johannes Elisabeth</creator><creator>Knops, Raoul Maarten Simon</creator><creator>Simons, Wilhelmus Franciscus Johannes</creator><creator>Butler, Hans</creator><creator>Ypma, Michael Frederik</creator><creator>Streefkerk, Bob</creator><creator>Valentin, Christiaan Louis</creator><scope>EVB</scope></search><sort><creationdate>20190402</creationdate><title>Projection system</title><author>Van Schoot, Jan Bernard Plechelmus ; De Jongh, Robertus Johannes Marinus ; Merkx, Leon Leonardus Franciscus ; Merry, Roel Johannes Elisabeth ; Knops, Raoul Maarten Simon ; Simons, Wilhelmus Franciscus Johannes ; Butler, Hans ; Ypma, Michael Frederik ; Streefkerk, Bob ; Valentin, Christiaan Louis</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10248027B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Van Schoot, Jan Bernard Plechelmus</creatorcontrib><creatorcontrib>De Jongh, Robertus Johannes Marinus</creatorcontrib><creatorcontrib>Merkx, Leon Leonardus Franciscus</creatorcontrib><creatorcontrib>Merry, Roel Johannes Elisabeth</creatorcontrib><creatorcontrib>Knops, Raoul Maarten Simon</creatorcontrib><creatorcontrib>Simons, Wilhelmus Franciscus Johannes</creatorcontrib><creatorcontrib>Butler, Hans</creatorcontrib><creatorcontrib>Ypma, Michael Frederik</creatorcontrib><creatorcontrib>Streefkerk, Bob</creatorcontrib><creatorcontrib>Valentin, Christiaan Louis</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Van Schoot, Jan Bernard Plechelmus</au><au>De Jongh, Robertus Johannes Marinus</au><au>Merkx, Leon Leonardus Franciscus</au><au>Merry, Roel Johannes Elisabeth</au><au>Knops, Raoul Maarten Simon</au><au>Simons, Wilhelmus Franciscus Johannes</au><au>Butler, Hans</au><au>Ypma, Michael Frederik</au><au>Streefkerk, Bob</au><au>Valentin, Christiaan Louis</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Projection system</title><date>2019-04-02</date><risdate>2019</risdate><abstract>A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US10248027B2 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Projection system |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T22%3A09%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Van%20Schoot,%20Jan%20Bernard%20Plechelmus&rft.date=2019-04-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10248027B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |