Cleaning formulations

A composition useful for removing residue from a semiconductor substrate comprising in effective cleaning amounts: from about 55 to 80% by weight of water; from about 0.3 to about 5.0% by weight of EDTA; from about 10.0 to about 30.0% by weight of an amine compound wherein the amine compound is sele...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: Inaoka, Seiji
Format: Patent
Sprache:eng
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