Lithographic apparatus and method

A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Mulder, Heine Melle, Baselmans, Johannes Jacobus Matheus, Engelen, Adrianus Franciscus Petrus, Van Greevenbroek, Hendrikus Robertus Marie, Tinnemans, Patricius Aloysius Jacobus, Eurlings, Markus Franciscus Antonius, Van Der Veen, Paul, Endendijk, Wilfred Edward
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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