Method for recessing a carbon-doped layer of a semiconductor structure

Semiconductor structure and methods of fabrication thereof are provided which includes, for instance, providing a carbon-doped material layer within a recess of a semiconductor structure; removing, in part, carbon from the carbon-doped material layer to obtain, at least in part, a carbon-depleted re...

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Bibliographische Detailangaben
1. Verfasser: Ryan, Errol Todd
Format: Patent
Sprache:eng
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