Method of forming patterns, patterns formed according to the method, and semiconductor device including the patterns

A method of forming patterns, patterns formed according to the method, and a semiconductor device including the patterns, the method including forming an etching subject layer on a substrate, forming a first layer on the etching subject layer such that the first layer has a projecting pattern, formi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Seo, Jinwoo, Bae, Jin-Hee, Yun, Huichan, Jang, Junyoung, Kwak, TaekSoo, Noh, Kunbae
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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