Plasma processing apparatus and sample stage thereof

There is disclosed a plasma processing apparatus for processing a wafer put on a sample stage disposed in a processing chamber within a vacuum vessel by the use of a plasma generated in the processing chamber after mounting the wafer on the sample stage. The apparatus has heaters in areas of the int...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Nagai, Koji, Nakamoto, Kazunori, Ohmoto, Yutaka, Kusumoto, Hironori
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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