Semiconductor device and method of fabricating the same

A method of fabricating a semiconductor device having a first region, a second region, and a third region between the first and second regions includes forming first and second preliminary active patterns protruding from a substrate in the first and second regions, respectively, forming mask pattern...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Oh, Sang-Kyu, Park, Jae-Ho, Baek, Sanghoon, Yang, Seolun, Song, Taejoong
Format: Patent
Sprache:eng
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