Manufacturing method for SiO2-TiO2 based glass and manufacturing method for photomask substrate made of SiO2-TiO2 based glass

A method for manufacturing an SiO2-TiO2 based glass upon a target by a direct method, includes: an ingot growing step of growing an SiO2-TiO2 based glass ingot having a predetermined length on the target by flame hydrolysis by feeding a silicon compound and a titanium compound into an oxyhydrogen fl...

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Bibliographische Detailangaben
1. Verfasser:	Yoshinari, Toshio
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY GLASS HOLOGRAPHY JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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