Versioning for configurations of reusable artifacts

Versioning for configurations of reusable artifacts

From a present version of a first artifact which is mutable, an artifact baseline corresponding to the present version of the first artifact can be created. Responsive to creating the artifact baseline, the present version of the first artifact can be made immutable. Present versions of children art...

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Hauptverfasser: Lee, Samuel Sung-Ok, Dugger, Troy R, Matthews, Schuyler B, Crossley, Nicholas D. J, Honey, David J, Wiborg Weber, Darcy L
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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creator Lee, Samuel Sung-Ok
Dugger, Troy R
Matthews, Schuyler B
Crossley, Nicholas D. J
Honey, David J
Wiborg Weber, Darcy L
description From a present version of a first artifact which is mutable, an artifact baseline corresponding to the present version of the first artifact can be created. Responsive to creating the artifact baseline, the present version of the first artifact can be made immutable. Present versions of children artifacts of the present version of the first artifact which are mutable also can be made immutable. Responsive to identifying a change to the present version of the first artifact, a new version of the first artifact can be automatically created, wherein the new version of the first artifact is mutable.
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subjects CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
title Versioning for configurations of reusable artifacts
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