Semiconductor device and method of forming stress relief layer between die and interconnect structure

A semiconductor device is made by forming a first conductive layer over a sacrificial carrier. A conductive pillar is formed over the first conductive layer. An active surface of a semiconductor die is mounted to the carrier. An encapsulant is deposited over the semiconductor die and around the cond...

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Bibliographische Detailangaben
Hauptverfasser: Yaojian, Yaojian, Shim, Il Kwon, Chow, Seng Guan
Format: Patent
Sprache:eng
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