Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices

Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices

A design aware system, method, and computer program product are provided for detecting overlay-related defects in multi-patterned fabricated devices. In use, a design of a multi-patterned fabricated device is received by a computer system. Then, the computer system automatically determines from the...

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Hauptverfasser: Cross, Andrew James, Sah, Kaushik
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
CALCULATING
COMPUTING
COUNTING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
SEMICONDUCTOR DEVICES
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Sah, Kaushik
description A design aware system, method, and computer program product are provided for detecting overlay-related defects in multi-patterned fabricated devices. In use, a design of a multi-patterned fabricated device is received by a computer system. Then, the computer system automatically determines from the design one or more areas of the design that are prone to causing overlay errors. Further, an indication of the determined one or more areas is output by the computer system to an inspection system for use in inspecting a multi-patterned device fabricated in accordance with the design.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10068323B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10068323B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10068323B23</originalsourceid><addsrcrecordid>eNqNjLsKwkAQANNYiPoPa28gJiC2Koq9Wof1bi8e3Iu7TSSF_-4J-QCrKWaYefE5vDESpDEx2Q1Y4peXgE6C8Db0TBFC9F1E-6PsBYPyESQxCdauAz9QNDiWkQwyyWxUNgm0A9sb1mVAzheXlcJn1GKqBi0oLYuZQpNoNXFRrC_n--laUvAtpYCCHHH7uG2rardv6uZYN_80X528SO0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices</title><source>esp@cenet</source><creator>Cross, Andrew James ; Sah, Kaushik</creator><creatorcontrib>Cross, Andrew James ; Sah, Kaushik</creatorcontrib><description>A design aware system, method, and computer program product are provided for detecting overlay-related defects in multi-patterned fabricated devices. In use, a design of a multi-patterned fabricated device is received by a computer system. Then, the computer system automatically determines from the design one or more areas of the design that are prone to causing overlay errors. Further, an indication of the determined one or more areas is output by the computer system to an inspection system for use in inspecting a multi-patterned device fabricated in accordance with the design.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CALCULATING ; COMPUTING ; COUNTING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180904&amp;DB=EPODOC&amp;CC=US&amp;NR=10068323B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180904&amp;DB=EPODOC&amp;CC=US&amp;NR=10068323B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Cross, Andrew James</creatorcontrib><creatorcontrib>Sah, Kaushik</creatorcontrib><title>Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices</title><description>A design aware system, method, and computer program product are provided for detecting overlay-related defects in multi-patterned fabricated devices. In use, a design of a multi-patterned fabricated device is received by a computer system. Then, the computer system automatically determines from the design one or more areas of the design that are prone to causing overlay errors. Further, an indication of the determined one or more areas is output by the computer system to an inspection system for use in inspecting a multi-patterned device fabricated in accordance with the design.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CALCULATING</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjLsKwkAQANNYiPoPa28gJiC2Koq9Wof1bi8e3Iu7TSSF_-4J-QCrKWaYefE5vDESpDEx2Q1Y4peXgE6C8Db0TBFC9F1E-6PsBYPyESQxCdauAz9QNDiWkQwyyWxUNgm0A9sb1mVAzheXlcJn1GKqBi0oLYuZQpNoNXFRrC_n--laUvAtpYCCHHH7uG2rardv6uZYN_80X528SO0</recordid><startdate>20180904</startdate><enddate>20180904</enddate><creator>Cross, Andrew James</creator><creator>Sah, Kaushik</creator><scope>EVB</scope></search><sort><creationdate>20180904</creationdate><title>Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices</title><author>Cross, Andrew James ; Sah, Kaushik</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10068323B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Cross, Andrew James</creatorcontrib><creatorcontrib>Sah, Kaushik</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Cross, Andrew James</au><au>Sah, Kaushik</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices</title><date>2018-09-04</date><risdate>2018</risdate><abstract>A design aware system, method, and computer program product are provided for detecting overlay-related defects in multi-patterned fabricated devices. In use, a design of a multi-patterned fabricated device is received by a computer system. Then, the computer system automatically determines from the design one or more areas of the design that are prone to causing overlay errors. Further, an indication of the determined one or more areas is output by the computer system to an inspection system for use in inspecting a multi-patterned device fabricated in accordance with the design.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
CALCULATING
COMPUTING
COUNTING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
SEMICONDUCTOR DEVICES
title Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T21%3A15%3A57IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Cross,%20Andrew%20James&rft.date=2018-09-04&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10068323B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true