Semiconductor process simulation device and simulation method thereof

A semiconductor process simulation method includes classifying a semiconductor process simulation into a plurality of blocks based on an annealing simulation, performing a shape simulation corresponding to a block selected from the plurality of blocks, and performing at least two ion implantation si...

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Bibliographische Detailangaben
Hauptverfasser: Kim, Sungchul, Doh, Jiseong, Lee, Wonsok, Jang, Sung-Hwan
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor process simulation method includes classifying a semiconductor process simulation into a plurality of blocks based on an annealing simulation, performing a shape simulation corresponding to a block selected from the plurality of blocks, and performing at least two ion implantation simulations among a plurality of ion implantation simulations corresponding to the selected block in parallel, based on result data of the shape simulation corresponding to the selected block.