Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers

Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wet...

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Hauptverfasser: Singh, Gurpreet, Tjio, Melia, Liu, Chi-Chun, Friz, Alexander M, Sanders, Daniel P, Cheng, Joy, Guillorn, Michael A, Tsai, HsinYu, Brink, Markus
Format: Patent
Sprache:eng
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