Substrate cleaning apparatus

A substrate cleaning apparatus for removing particles adhered to a substrate includes a cleaning chamber for cleaning a substrate under a vacuum atmosphere, a mounting unit, provided in the cleaning chamber, for mounting the substrate thereon. The substrate cleaning apparatus further includes a nozz...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Inai, Kensuke, Dobashi, Kazuya
Format: Patent
Sprache:eng
Schlagworte:
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