Ion implantation system having beam angle control in drift and deceleration modes

An ion implantation system has an ion source forming an ion beam. An mass analyzer defines and varies a mass analyzed beam along a beam path. A moveable mass resolving aperture assembly has a resolving aperture whose position is selectively varied in response to the variation of the beam path by the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Vanderberg, Bo H, Eisner, Edward C
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROTHERAPY HUMAN NECESSITIES HYGIENE MAGNETOTHERAPY MEDICAL OR VETERINARY SCIENCE RADIATION THERAPY ULTRASOUND THERAPY
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