Magnetic memory device and method of fabricating the same

A method of fabricating a magnetic memory device includes forming an interlayered insulating layer on a substrate, forming a landing pad to pass through the interlayered insulating layer, forming a protection insulating layer on the interlayered insulating layer to cover a top surface of the landing...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Kim, Woojin, Joo, Minkyoung, Shin, Kwangil, Nam, KyungTae, Suh, Kiseok, Han, Shinhee, Koh, Gwanhyeob
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Kim, Woojin
Joo, Minkyoung
Shin, Kwangil
Nam, KyungTae
Suh, Kiseok
Han, Shinhee
Koh, Gwanhyeob
description A method of fabricating a magnetic memory device includes forming an interlayered insulating layer on a substrate, forming a landing pad to pass through the interlayered insulating layer, forming a protection insulating layer on the interlayered insulating layer to cover a top surface of the landing pad, forming a bottom electrode to pass through the protection insulating layer and through the interlayered insulating layer, forming a magnetic tunnel junction layer on the protection insulating layer; and patterning the magnetic tunnel junction layer to form a magnetic tunnel junction pattern on the bottom electrode.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US10032981B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US10032981B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US10032981B23</originalsourceid><addsrcrecordid>eNrjZLD0TUzPSy3JTFbITc3NL6pUSEkty0xOVUjMSwGKlGTkpyjkpymkJSYVZSYnlmTmpSuUZKQqFCfmpvIwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTkVKDB8aHBhgYGxkaWFoZORsbEqAEAFiQuXw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Magnetic memory device and method of fabricating the same</title><source>esp@cenet</source><creator>Kim, Woojin ; Joo, Minkyoung ; Shin, Kwangil ; Nam, KyungTae ; Suh, Kiseok ; Han, Shinhee ; Koh, Gwanhyeob</creator><creatorcontrib>Kim, Woojin ; Joo, Minkyoung ; Shin, Kwangil ; Nam, KyungTae ; Suh, Kiseok ; Han, Shinhee ; Koh, Gwanhyeob</creatorcontrib><description>A method of fabricating a magnetic memory device includes forming an interlayered insulating layer on a substrate, forming a landing pad to pass through the interlayered insulating layer, forming a protection insulating layer on the interlayered insulating layer to cover a top surface of the landing pad, forming a bottom electrode to pass through the protection insulating layer and through the interlayered insulating layer, forming a magnetic tunnel junction layer on the protection insulating layer; and patterning the magnetic tunnel junction layer to form a magnetic tunnel junction pattern on the bottom electrode.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INFORMATION STORAGE ; PHYSICS ; SEMICONDUCTOR DEVICES ; STATIC STORES</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180724&amp;DB=EPODOC&amp;CC=US&amp;NR=10032981B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180724&amp;DB=EPODOC&amp;CC=US&amp;NR=10032981B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Kim, Woojin</creatorcontrib><creatorcontrib>Joo, Minkyoung</creatorcontrib><creatorcontrib>Shin, Kwangil</creatorcontrib><creatorcontrib>Nam, KyungTae</creatorcontrib><creatorcontrib>Suh, Kiseok</creatorcontrib><creatorcontrib>Han, Shinhee</creatorcontrib><creatorcontrib>Koh, Gwanhyeob</creatorcontrib><title>Magnetic memory device and method of fabricating the same</title><description>A method of fabricating a magnetic memory device includes forming an interlayered insulating layer on a substrate, forming a landing pad to pass through the interlayered insulating layer, forming a protection insulating layer on the interlayered insulating layer to cover a top surface of the landing pad, forming a bottom electrode to pass through the protection insulating layer and through the interlayered insulating layer, forming a magnetic tunnel junction layer on the protection insulating layer; and patterning the magnetic tunnel junction layer to form a magnetic tunnel junction pattern on the bottom electrode.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INFORMATION STORAGE</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>STATIC STORES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD0TUzPSy3JTFbITc3NL6pUSEkty0xOVUjMSwGKlGTkpyjkpymkJSYVZSYnlmTmpSuUZKQqFCfmpvIwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTkVKDB8aHBhgYGxkaWFoZORsbEqAEAFiQuXw</recordid><startdate>20180724</startdate><enddate>20180724</enddate><creator>Kim, Woojin</creator><creator>Joo, Minkyoung</creator><creator>Shin, Kwangil</creator><creator>Nam, KyungTae</creator><creator>Suh, Kiseok</creator><creator>Han, Shinhee</creator><creator>Koh, Gwanhyeob</creator><scope>EVB</scope></search><sort><creationdate>20180724</creationdate><title>Magnetic memory device and method of fabricating the same</title><author>Kim, Woojin ; Joo, Minkyoung ; Shin, Kwangil ; Nam, KyungTae ; Suh, Kiseok ; Han, Shinhee ; Koh, Gwanhyeob</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US10032981B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INFORMATION STORAGE</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>STATIC STORES</topic><toplevel>online_resources</toplevel><creatorcontrib>Kim, Woojin</creatorcontrib><creatorcontrib>Joo, Minkyoung</creatorcontrib><creatorcontrib>Shin, Kwangil</creatorcontrib><creatorcontrib>Nam, KyungTae</creatorcontrib><creatorcontrib>Suh, Kiseok</creatorcontrib><creatorcontrib>Han, Shinhee</creatorcontrib><creatorcontrib>Koh, Gwanhyeob</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Kim, Woojin</au><au>Joo, Minkyoung</au><au>Shin, Kwangil</au><au>Nam, KyungTae</au><au>Suh, Kiseok</au><au>Han, Shinhee</au><au>Koh, Gwanhyeob</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Magnetic memory device and method of fabricating the same</title><date>2018-07-24</date><risdate>2018</risdate><abstract>A method of fabricating a magnetic memory device includes forming an interlayered insulating layer on a substrate, forming a landing pad to pass through the interlayered insulating layer, forming a protection insulating layer on the interlayered insulating layer to cover a top surface of the landing pad, forming a bottom electrode to pass through the protection insulating layer and through the interlayered insulating layer, forming a magnetic tunnel junction layer on the protection insulating layer; and patterning the magnetic tunnel junction layer to form a magnetic tunnel junction pattern on the bottom electrode.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US10032981B2
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INFORMATION STORAGE
PHYSICS
SEMICONDUCTOR DEVICES
STATIC STORES
title Magnetic memory device and method of fabricating the same
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T11%3A05%3A47IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Kim,%20Woojin&rft.date=2018-07-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS10032981B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true