TWI851947B

A semiconductor device includes: a first stacked film including first electrode layers; an insulating layer provided on the first stacked film; a second stacked film provided on the insulating layer and including second electrode layers; and a columnar portion extending through the first stacked fil...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MITSUNO, YOSUKE, SOTOME, SHINICHI, SUZUKI, RYOTA, HAMADA, TATSUFUMI, KUKI, TOMOHIRO
Format: Patent
Sprache:chi
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Beschreibung
Zusammenfassung:A semiconductor device includes: a first stacked film including first electrode layers; an insulating layer provided on the first stacked film; a second stacked film provided on the insulating layer and including second electrode layers; and a columnar portion extending through the first stacked film, the insulating layer, and the second stacked film. The columnar portion extending in the insulating layer includes a first portion having a first width in a second direction intersecting the first direction, and a second portion provided at a different location along the first direction and having a second width in the second direction. The columnar portion extending in the second stacked film includes a third portion having a third width along the second direction. The second width is larger than the first width and the third width.