TWI850201B

To provide a radiation sensitive resin composition capable of achieving both of radiation sensitivity and so called PCD, PED margin property.SOLUTION: There is provided a radiation sensitive resin composition containing a polymer component (A) having a structural unit (I) containing an aromatic ring...

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Bibliographische Detailangaben
Hauptverfasser:	ASAOKA, TAKAHIDE, NARUKO, AKITO, KUDOU, KAZUNARI, MATSUMOTO, TERUYUKI
Format:	Patent
Sprache:	chi
Schlagworte:	ADVERTISING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON CRYPTOGRAPHY DISPLAY DISPLAYING EDUCATION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY LABELS OR NAME-PLATES MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEALS SEMICONDUCTOR DEVICES SIGNS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	To provide a radiation sensitive resin composition capable of achieving both of radiation sensitivity and so called PCD, PED margin property.SOLUTION: There is provided a radiation sensitive resin composition containing a polymer component (A) having a structural unit (I) containing an aromatic ring and an alkoxysilyl group directly bound to the aromatic ring and a structural unit (II) containing an acidic group excluding a structural unit derived from aromatic unsaturated carboxylic acid and a hydroxy fluoride alkyl group-containing monomer in same or different polymer, a radiation sensitive compound (B) and an organic solvent (G).SELECTED DRAWING: None