Impedance matching in a rf power generation system
An impedance matching network including a mixing module. The mixing module receives a plurality admittances based upon at least one parameter sensed from an output which generated by an RF generator. The output signal is a pulsed RF signal having a plurality of states for each pulse and the pluralit...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | JONGMIN, KIM HOHYOUNG, LEE JAECHUL, JUNG CHANGHEE, LEE KWANG HO, KIM |
| description | An impedance matching network including a mixing module. The mixing module receives a plurality admittances based upon at least one parameter sensed from an output which generated by an RF generator. The output signal is a pulsed RF signal having a plurality of states for each pulse and the plurality of admittances correspond to the plurality states. The mixing module generates a virtual admittance determined in accordance with the plurality of admittances adjusted by a gain. The impedance matching module receives the virtual admittance and generates a command to adjust a capacitance of the impedance matching network or a command to adjust a frequency of the output signal in accordance with the virtual admittance. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI847172BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI847172BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI847172BB3</originalsourceid><addsrcrecordid>eNrjZDDyzC1ITUnMS05VyE0sSc7IzEtXyMxTSFQoSlMoyC9PLVJIT81LLUosyczPUyiuLC5JzeVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJQB0l8SHhnhYm5obmRk5OxkQoAQBk1Cv8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Impedance matching in a rf power generation system</title><source>esp@cenet</source><creator>JONGMIN, KIM ; HOHYOUNG, LEE ; JAECHUL, JUNG ; CHANGHEE, LEE ; KWANG HO, KIM</creator><creatorcontrib>JONGMIN, KIM ; HOHYOUNG, LEE ; JAECHUL, JUNG ; CHANGHEE, LEE ; KWANG HO, KIM</creatorcontrib><description>An impedance matching network including a mixing module. The mixing module receives a plurality admittances based upon at least one parameter sensed from an output which generated by an RF generator. The output signal is a pulsed RF signal having a plurality of states for each pulse and the plurality of admittances correspond to the plurality states. The mixing module generates a virtual admittance determined in accordance with the plurality of admittances adjusted by a gain. The impedance matching module receives the virtual admittance and generates a command to adjust a capacitance of the impedance matching network or a command to adjust a frequency of the output signal in accordance with the virtual admittance.</description><language>chi ; eng</language><subject>BASIC ELECTRONIC CIRCUITRY ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; RESONATORS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240701&DB=EPODOC&CC=TW&NR=I847172B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240701&DB=EPODOC&CC=TW&NR=I847172B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JONGMIN, KIM</creatorcontrib><creatorcontrib>HOHYOUNG, LEE</creatorcontrib><creatorcontrib>JAECHUL, JUNG</creatorcontrib><creatorcontrib>CHANGHEE, LEE</creatorcontrib><creatorcontrib>KWANG HO, KIM</creatorcontrib><title>Impedance matching in a rf power generation system</title><description>An impedance matching network including a mixing module. The mixing module receives a plurality admittances based upon at least one parameter sensed from an output which generated by an RF generator. The output signal is a pulsed RF signal having a plurality of states for each pulse and the plurality of admittances correspond to the plurality states. The mixing module generates a virtual admittance determined in accordance with the plurality of admittances adjusted by a gain. The impedance matching module receives the virtual admittance and generates a command to adjust a capacitance of the impedance matching network or a command to adjust a frequency of the output signal in accordance with the virtual admittance.</description><subject>BASIC ELECTRONIC CIRCUITRY</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>RESONATORS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDyzC1ITUnMS05VyE0sSc7IzEtXyMxTSFQoSlMoyC9PLVJIT81LLUosyczPUyiuLC5JzeVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJQB0l8SHhnhYm5obmRk5OxkQoAQBk1Cv8</recordid><startdate>20240701</startdate><enddate>20240701</enddate><creator>JONGMIN, KIM</creator><creator>HOHYOUNG, LEE</creator><creator>JAECHUL, JUNG</creator><creator>CHANGHEE, LEE</creator><creator>KWANG HO, KIM</creator><scope>EVB</scope></search><sort><creationdate>20240701</creationdate><title>Impedance matching in a rf power generation system</title><author>JONGMIN, KIM ; HOHYOUNG, LEE ; JAECHUL, JUNG ; CHANGHEE, LEE ; KWANG HO, KIM</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI847172BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRONIC CIRCUITRY</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>RESONATORS</topic><toplevel>online_resources</toplevel><creatorcontrib>JONGMIN, KIM</creatorcontrib><creatorcontrib>HOHYOUNG, LEE</creatorcontrib><creatorcontrib>JAECHUL, JUNG</creatorcontrib><creatorcontrib>CHANGHEE, LEE</creatorcontrib><creatorcontrib>KWANG HO, KIM</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JONGMIN, KIM</au><au>HOHYOUNG, LEE</au><au>JAECHUL, JUNG</au><au>CHANGHEE, LEE</au><au>KWANG HO, KIM</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Impedance matching in a rf power generation system</title><date>2024-07-01</date><risdate>2024</risdate><abstract>An impedance matching network including a mixing module. The mixing module receives a plurality admittances based upon at least one parameter sensed from an output which generated by an RF generator. The output signal is a pulsed RF signal having a plurality of states for each pulse and the plurality of admittances correspond to the plurality states. The mixing module generates a virtual admittance determined in accordance with the plurality of admittances adjusted by a gain. The impedance matching module receives the virtual admittance and generates a command to adjust a capacitance of the impedance matching network or a command to adjust a frequency of the output signal in accordance with the virtual admittance.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TWI847172BB |
| source | esp@cenet |
| subjects | BASIC ELECTRONIC CIRCUITRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS RESONATORS |
| title | Impedance matching in a rf power generation system |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-26T13%3A39%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JONGMIN,%20KIM&rft.date=2024-07-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI847172BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |