Optical imaging devices for optical arrangement of lithography and methods thereof, and optical imaging devices for lithography and/or wafer inspection and methods thereof, methods for supporting an optical element unit having an optical element in a lithographic optical imaging device

An optical arrangement for use in an optical imaging device includes an optical element unit and a detection device and/or an actuating device. The optical element unit includes at least one optical element. The detection device determines in a plurality of M degrees of freedom in each case a detect...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KHARITONOV, ALEXANDER, KUGLER, JENS, GEUPPERT, BERNHARD
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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