TWI827991B

The invention relates to a lower electrode assembly and a plasma processing device comprising the lower electrode assembly, and the lower electrode assembly comprises a pedestal; the electrostatic chuck is positioned on the base, is used for adsorbing a substrate to be treated and is made of a ceram...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WU, DEE, JIANG, JIA-WEI, GUO, ER-FEI, WONG, MANUS
Format:	Patent
Sprache:	chi
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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