Method and apparatus for measuring particles

An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel...

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Hauptverfasser: YASSERI, AMIR A, KERNS, JOHN MICHAEL, OUTKA, DUANE, LA CROIX, CLIFF, DAUGHERTY, JOHN, HUNDI, GIRISH M
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Sprache:chi ; eng
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creator YASSERI, AMIR A
KERNS, JOHN MICHAEL
OUTKA, DUANE
LA CROIX, CLIFF
DAUGHERTY, JOHN
HUNDI, GIRISH M
description An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel, wherein the critical surface of the part is exposed to the inert gas when the part is mounted in the vessel. At least one analyzer is adapted to receive inert gas from the at least one diffuser and measures contaminants in the inert gas.
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language chi ; eng
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
title Method and apparatus for measuring particles
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