TWI827101B

Provided is a plasma processing apparatus having high safety whose running cost is reduced. The plasma processing apparatus includes: a vacuum container; a processing chamber disposed inside the vacuum container; and a processing gas line through which a processing gas is supplied into the processin...

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Hauptverfasser:	SATO, KOHEI, ISOMURA, RYOICHI, TAKAO, YUSUKE
Format:	Patent
Sprache:	chi
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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creator	SATO, KOHEI ISOMURA, RYOICHI TAKAO, YUSUKE
description	Provided is a plasma processing apparatus having high safety whose running cost is reduced. The plasma processing apparatus includes: a vacuum container; a processing chamber disposed inside the vacuum container; and a processing gas line through which a processing gas is supplied into the processing chamber to form plasma in the processing chamber, in which the processing unit includes a plurality of pipes through which a plurality of types of gases flow respectively every type of gas, and a box body surrounding the pipes, and air whose temperature is adjusted to a predetermined range is supplied to the box body.
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subjects	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
title	TWI827101B
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