A method of processing an etching waste medium from circuit board and/or substrate manufacture
It is described a method of processing an etching waste medium from circuit board and/or substrate manufacture, the method comprising: i) providing a medium to be processed (11), being the etching waste medium, in particular from an etching process (150), wherein the medium to be processed (11) comp...
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| creator | SCHREI, MARTIN MOITZI, HEINZ REDL, ALOIS KLOCEK, JOLANTA GROSS, FRIEDRICH EBINGER, CHRISTOPH ZANKER, ANDREAS KERN, KONSTANTIN |
| description | It is described a method of processing an etching waste medium from circuit board and/or substrate manufacture, the method comprising: i) providing a medium to be processed (11), being the etching waste medium, in particular from an etching process (150), wherein the medium to be processed (11) comprises a metal salt to be processed and an acid (15); ii) processing the medium to be processed (11) in an ion exchange process (145), so that the metal salt to be processed is exchanged by a metal salt, and a metal salt containing medium (10) is obtained from the medium to be processed (11); hereby a) streaming a first process cycle (170) through the ion exchange process (145), wherein the first process cycle (170) is a first closed loop that yields substantially only elementary metal (50); and b) streaming a second process cycle (180) through the ion exchange process (140), wherein the second process cycle (180) is a second closed loop that yields substantially only purified water (188) and/or a metal-depleted sal |
| format | Patent |
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GROSS, FRIEDRICH ; EBINGER, CHRISTOPH ; ZANKER, ANDREAS ; KERN, KONSTANTIN</creatorcontrib><description>It is described a method of processing an etching waste medium from circuit board and/or substrate manufacture, the method comprising: i) providing a medium to be processed (11), being the etching waste medium, in particular from an etching process (150), wherein the medium to be processed (11) comprises a metal salt to be processed and an acid (15); ii) processing the medium to be processed (11) in an ion exchange process (145), so that the metal salt to be processed is exchanged by a metal salt, and a metal salt containing medium (10) is obtained from the medium to be processed (11); hereby a) streaming a first process cycle (170) through the ion exchange process (145), wherein the first process cycle (170) is a first closed loop that yields substantially only elementary metal (50); and b) streaming a second process cycle (180) through the ion exchange process (140), wherein the second process cycle (180) is a second closed loop that yields substantially only purified water (188) and/or a metal-depleted sal</description><language>chi ; eng</language><subject>CHEMISTRY ; FERROUS OR NON-FERROUS ALLOYS ; METALLURGY ; PRETREATMENT OF RAW MATERIALS ; PRODUCTION AND REFINING OF METALS ; TREATMENT OF ALLOYS OR NON-FERROUS METALS ; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231121&DB=EPODOC&CC=TW&NR=I823276B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231121&DB=EPODOC&CC=TW&NR=I823276B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHREI, MARTIN</creatorcontrib><creatorcontrib>MOITZI, HEINZ</creatorcontrib><creatorcontrib>REDL, ALOIS</creatorcontrib><creatorcontrib>KLOCEK, JOLANTA</creatorcontrib><creatorcontrib>GROSS, FRIEDRICH</creatorcontrib><creatorcontrib>EBINGER, CHRISTOPH</creatorcontrib><creatorcontrib>ZANKER, ANDREAS</creatorcontrib><creatorcontrib>KERN, KONSTANTIN</creatorcontrib><title>A method of processing an etching waste medium from circuit board and/or substrate manufacture</title><description>It is described a method of processing an etching waste medium from circuit board and/or substrate manufacture, the method comprising: i) providing a medium to be processed (11), being the etching waste medium, in particular from an etching process (150), wherein the medium to be processed (11) comprises a metal salt to be processed and an acid (15); ii) processing the medium to be processed (11) in an ion exchange process (145), so that the metal salt to be processed is exchanged by a metal salt, and a metal salt containing medium (10) is obtained from the medium to be processed (11); hereby a) streaming a first process cycle (170) through the ion exchange process (145), wherein the first process cycle (170) is a first closed loop that yields substantially only elementary metal (50); and b) streaming a second process cycle (180) through the ion exchange process (140), wherein the second process cycle (180) is a second closed loop that yields substantially only purified water (188) and/or a metal-depleted sal</description><subject>CHEMISTRY</subject><subject>FERROUS OR NON-FERROUS ALLOYS</subject><subject>METALLURGY</subject><subject>PRETREATMENT OF RAW MATERIALS</subject><subject>PRODUCTION AND REFINING OF METALS</subject><subject>TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><subject>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNykEKwkAMQNFuXIh6h1xAhBbUrRVF9wV3lnQmYwfspCQZvL4teABX_y_esnieYCDr2QMHGIUdqcb0AkxA5vp5P6hGk_IxDxCEB3BRXI4GHaP4ifodC2ju1ARniikHdJaF1sUi4Ftp8-uqgOulOd-2NHJLOqKjRNY2j_uxrMrDvq6rP8gXqe08mw</recordid><startdate>20231121</startdate><enddate>20231121</enddate><creator>SCHREI, MARTIN</creator><creator>MOITZI, HEINZ</creator><creator>REDL, ALOIS</creator><creator>KLOCEK, JOLANTA</creator><creator>GROSS, FRIEDRICH</creator><creator>EBINGER, CHRISTOPH</creator><creator>ZANKER, ANDREAS</creator><creator>KERN, KONSTANTIN</creator><scope>EVB</scope></search><sort><creationdate>20231121</creationdate><title>A method of processing an etching waste medium from circuit board and/or substrate manufacture</title><author>SCHREI, MARTIN ; 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ii) processing the medium to be processed (11) in an ion exchange process (145), so that the metal salt to be processed is exchanged by a metal salt, and a metal salt containing medium (10) is obtained from the medium to be processed (11); hereby a) streaming a first process cycle (170) through the ion exchange process (145), wherein the first process cycle (170) is a first closed loop that yields substantially only elementary metal (50); and b) streaming a second process cycle (180) through the ion exchange process (140), wherein the second process cycle (180) is a second closed loop that yields substantially only purified water (188) and/or a metal-depleted sal</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMISTRY FERROUS OR NON-FERROUS ALLOYS METALLURGY PRETREATMENT OF RAW MATERIALS PRODUCTION AND REFINING OF METALS TREATMENT OF ALLOYS OR NON-FERROUS METALS TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE |
| title | A method of processing an etching waste medium from circuit board and/or substrate manufacture |
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