Substrate treating apparatus and substrate treating method

The inventive concept provides a substrate treating method. The substrate treating method comprising: a liquid treating step for cleaning a substrate by supplying a treating liquid to the substrate in a first process chamber; a transfer step for transferring the substrate to a second process chamber...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JUNG, JINWOO, LEE, YOUNG HUN, YOON, DO HYEON
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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