Computer?readable medium, method of processing substrates, and system for processing substrates

Computer?readable medium, method of processing substrates, and system for processing substrates

The systems and methods discussed herein are for a cluster tool that can be used for MOSFET device fabrication, including NMOS and PMOS devices. The cluster tool includes process chambers for pre-cleaning, metal-silicide or metal-germanide film formation, and surface protection operations such as ca...

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Hauptverfasser: HUNG, RAYMOND HOIMAN, LI, XUEBIN, CHU, SCHUBERT S, SANCHEZ, ERROL ANTONIO C, THAREJA, GAURAV, LIU, PATRICIA M
Format: Patent
Sprache:chi ; eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator HUNG, RAYMOND HOIMAN
LI, XUEBIN
CHU, SCHUBERT S
SANCHEZ, ERROL ANTONIO C
THAREJA, GAURAV
LIU, PATRICIA M
description The systems and methods discussed herein are for a cluster tool that can be used for MOSFET device fabrication, including NMOS and PMOS devices. The cluster tool includes process chambers for pre-cleaning, metal-silicide or metal-germanide film formation, and surface protection operations such as capping and nitridation. The cluster tool can include one or more process chambers configured to form a source and a drain. The devices fabricated in the cluster tool are fabricated to have at least one protective layer formed over the metal-silicide or metal-germanide film to protect the film from contamination during handling and transfer to separate systems.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Computer?readable medium, method of processing substrates, and system for processing substrates
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