Method for generating optical proximity correction model

Method for generating optical proximity correction model

A method for generating an optical proximity correction model is provided. The method includes: receiving optical proximity correction data; adding adjustment terms including a weight operation and a penalty operation into a cost function to generate an adjusted cost function; performing a regressio...

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Bibliographische Detailangaben
Hauptverfasser: MAI, YUNG CHING, HUANG, YIHAO, LAI, JUNNG, YEH, SHIN-SHING, LIN, CHIAI
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A method for generating an optical proximity correction model is provided. The method includes: receiving optical proximity correction data; adding adjustment terms including a weight operation and a penalty operation into a cost function to generate an adjusted cost function; performing a regression operation on the optical proximity correction data to generate an optical proximity correction model according to the adjusted cost function.