Support unit and substrate treating apparatus

Disclosed is a support unit. The support unit that supports a substrate may include a chuck stage that is rotatable, a heating member disposed above the chuck stage and that heats the substrate supported by the support unit, a power source that applies electric power to the heating member, a window...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YUN, KANGSEOP, CHOI, JUNG BONG, SONG, SOO HAN, KIM, CHUL GOO
Format: Patent
Sprache:chi ; eng
Schlagworte:
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