SYSTEMS AND METHODS FOR THERMALLY CONDITIONING A WAFER IN A CHARGED PARTICLE BEAM APPARATUS

An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristic...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: VAN HEUMEN, MARTIJN PETRUS CHRISTIANUS, GOSEN, JEROEN GERARD
Format: Patent
Sprache:chi ; eng
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