Resist underlayer composition, and method of forming patterns
Provided are a resist underlayer composition including a polymer having a ring backbone including two or more nitrogen atoms in a ring, a compound represented by Chemical Formula 1, and a solvent; and a method of forming patterns using the resist underlayer composition:The definitions of Chemical Fo...
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| creator | KIM, MINSOO BAEK, JAEYEOL PARK, HYEON CHON, MINKI SONG, DAESEOK BAE, SHINHYO CHOI, YOOJEONG JIN, HWAYOUNG KWON, SOONHYUNG KIM, SEONGJIN |
| description | Provided are a resist underlayer composition including a polymer having a ring backbone including two or more nitrogen atoms in a ring, a compound represented by Chemical Formula 1, and a solvent; and a method of forming patterns using the resist underlayer composition:The definitions of Chemical Formula 1 are as described in the detailed description. |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Resist underlayer composition, and method of forming patterns |
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