Vapor chamber and method for fabricating the same

This disclosure relates to a method for fabricating a vapor chamber. The method includes positioning a capillary structure on a first cover, forming an accommodation space, a flow channel, and a plurality of posts on a first surface of a second cover, covering the first cover with the second cover,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIU, LEI-LEI, CHENG, JENIH
Format: Patent
Sprache:chi ; eng
Schlagworte:
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