TWI772171B

Disclosed is a protective film for a chemical mechanical polishing pad dresser, wherein the dresser at least comprises a stainless-steel base material, a nickel layer and a plurality of diamond particles. The nickel layer covers the surface of the stainless-steel base material. Each diamond particle...

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Bibliographische Detailangaben

Hauptverfasser:	ZHANG, LI-JUN, OU, ZI-YU, LI, ZHI-WEI, CHEN, JIA-PEI
Format:	Patent
Sprache:	chi
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING
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