TWI766981B
A coating treatment device (10) comprises: substrate movement units (12, 13) that hold a substrate and move the substrate in the horizontal direction; an oblong coating nozzle (14) that extends in a direction orthogonal to the direction of movement of the substrate movement units, and discharges a c...
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Format: | Patent |
Sprache: | chi |
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Zusammenfassung: | A coating treatment device (10) comprises: substrate movement units (12, 13) that hold a substrate and move the substrate in the horizontal direction; an oblong coating nozzle (14) that extends in a direction orthogonal to the direction of movement of the substrate movement units, and discharges a coating liquid onto the substrate held by the substrate movement units; a coating nozzle movement unit (16) that moves the coating nozzle in the direction in which the coating nozzle extends; and a control unit (18) that controls the direction in which the substrate held by the substrate movement units is coated by controlling the movement speed of the substrate movement units and the coating nozzle movement unit. |
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