Method for determining surface parameters of a patterning device, method for compensating a heating effect and lithographic apparatus for characterizing a patterning device
A method is provided for determining surface parameters of an patterning device, the method comprises the steps of: providing the patterning device at a first focal plane of a chromatic lens, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein...
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| creator | PEN, HERMEN FOLKEN MOEST, BEARRACH ONCK, DERK PIJNENBURG, JOHANNES ADRIANUS CORNELIS MARIA EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA JEUNINK, ANDRE BERNARDUS |
| description | A method is provided for determining surface parameters of an patterning device, the method comprises the steps of: providing the patterning device at a first focal plane of a chromatic lens, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein the radiation comprises a plurality of wavelengths, determining a position of the illuminated part of the patterning device in a first and second direction, collecting at least a portion of radiation reflected by the patterning device through the chromatic lens, measuring an intensity of the collected portion of radiation as a function of wavelength, to obtain spectral information of the illuminated area, and determining the surface parameters of the patterning device at the determined position from the spectral information. |
| format | Patent |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Method for determining surface parameters of a patterning device, method for compensating a heating effect and lithographic apparatus for characterizing a patterning device |
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