Method for determining surface parameters of a patterning device, method for compensating a heating effect and lithographic apparatus for characterizing a patterning device

Method for determining surface parameters of a patterning device, method for compensating a heating effect and lithographic apparatus for characterizing a patterning device

A method is provided for determining surface parameters of an patterning device, the method comprises the steps of: providing the patterning device at a first focal plane of a chromatic lens, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PEN, HERMEN FOLKEN, MOEST, BEARRACH, ONCK, DERK, PIJNENBURG, JOHANNES ADRIANUS CORNELIS MARIA, EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA, JEUNINK, ANDRE BERNARDUS
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A method is provided for determining surface parameters of an patterning device, the method comprises the steps of: providing the patterning device at a first focal plane of a chromatic lens, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein the radiation comprises a plurality of wavelengths, determining a position of the illuminated part of the patterning device in a first and second direction, collecting at least a portion of radiation reflected by the patterning device through the chromatic lens, measuring an intensity of the collected portion of radiation as a function of wavelength, to obtain spectral information of the illuminated area, and determining the surface parameters of the patterning device at the determined position from the spectral information.