Chuck for edge bevel removal and method for centering a wafer prior to edge bevel removal

A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the suppo...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	SWEENEY, CIAN OWEN, LABRIE, AARON LOUIS, BRAENDLE, ROBERT LYNDEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	SWEENEY, CIAN OWEN LABRIE, AARON LOUIS BRAENDLE, ROBERT LYNDEN
description	A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms. The gas conduits supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. During centering, the wafer is floated on a gas cushion which reduces wear of the support pins.
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI757276BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI757276BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI757276BB3</originalsourceid><addsrcrecordid>eNrjZIh0zihNzlZIyy9SSE1JT1VISi1LzVEoSs3NL0vMUUjMS1HITS3JyE8Bq0hOzStJLcrMS1dIVChPTEstUigoygSKl-Rj0czDwJqWmFOcyguluRkU3FxDnD10Uwvy41OLCxKBpqWWxIeEe5qbmhuZmzk5GROhBAAA9jn0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Chuck for edge bevel removal and method for centering a wafer prior to edge bevel removal</title><source>esp@cenet</source><creator>SWEENEY, CIAN OWEN ; LABRIE, AARON LOUIS ; BRAENDLE, ROBERT LYNDEN</creator><creatorcontrib>SWEENEY, CIAN OWEN ; LABRIE, AARON LOUIS ; BRAENDLE, ROBERT LYNDEN</creatorcontrib><description>A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms. The gas conduits supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. During centering, the wafer is floated on a gas cushion which reduces wear of the support pins.</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CLEANING ; CLEANING IN GENERAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220311&DB=EPODOC&CC=TW&NR=I757276B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220311&DB=EPODOC&CC=TW&NR=I757276B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SWEENEY, CIAN OWEN</creatorcontrib><creatorcontrib>LABRIE, AARON LOUIS</creatorcontrib><creatorcontrib>BRAENDLE, ROBERT LYNDEN</creatorcontrib><title>Chuck for edge bevel removal and method for centering a wafer prior to edge bevel removal</title><description>A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms. The gas conduits supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. During centering, the wafer is floated on a gas cushion which reduces wear of the support pins.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIh0zihNzlZIyy9SSE1JT1VISi1LzVEoSs3NL0vMUUjMS1HITS3JyE8Bq0hOzStJLcrMS1dIVChPTEstUigoygSKl-Rj0czDwJqWmFOcyguluRkU3FxDnD10Uwvy41OLCxKBpqWWxIeEe5qbmhuZmzk5GROhBAAA9jn0</recordid><startdate>20220311</startdate><enddate>20220311</enddate><creator>SWEENEY, CIAN OWEN</creator><creator>LABRIE, AARON LOUIS</creator><creator>BRAENDLE, ROBERT LYNDEN</creator><scope>EVB</scope></search><sort><creationdate>20220311</creationdate><title>Chuck for edge bevel removal and method for centering a wafer prior to edge bevel removal</title><author>SWEENEY, CIAN OWEN ; LABRIE, AARON LOUIS ; BRAENDLE, ROBERT LYNDEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI757276BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SWEENEY, CIAN OWEN</creatorcontrib><creatorcontrib>LABRIE, AARON LOUIS</creatorcontrib><creatorcontrib>BRAENDLE, ROBERT LYNDEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SWEENEY, CIAN OWEN</au><au>LABRIE, AARON LOUIS</au><au>BRAENDLE, ROBERT LYNDEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Chuck for edge bevel removal and method for centering a wafer prior to edge bevel removal</title><date>2022-03-11</date><risdate>2022</risdate><abstract>A chuck useful for supporting a wafer during an edge bevel removal (EBR) process comprises a rotatable center hub having a plurality of support arms extending outwardly from the rotatable center hub, support pins on ends of the support arms, gas passages extending through upper surfaces of the support pins, and gas conduits in the support arms. The gas conduits supply gas to the gas passages or apply a vacuum to the gas passages. The support arms can include alignment cams which are rotatable from an outer non-alignment position away from a periphery of the wafer to an inner alignment position at which the wafer is centered. During centering, the wafer is floated on a gas cushion which reduces wear of the support pins.</abstract><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	chi ; eng
recordid	cdi_epo_espacenet_TWI757276BB
source	esp@cenet
subjects	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
title	Chuck for edge bevel removal and method for centering a wafer prior to edge bevel removal
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T07%3A51%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SWEENEY,%20CIAN%20OWEN&rft.date=2022-03-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI757276BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true