Photomask and fabrication method therefor
A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifte...
Gespeichert in:
| Hauptverfasser: | , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | YANG, MIN-AN WEI, SHAOI CHANG, HAO-MING HSU, SHENGANG LAI, CHIEN-HUNG LIN, CHENG-MING CHU, YUANIH WANG, HSUAN-WEN |
| description | A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI725192BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI725192BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI725192BB3</originalsourceid><addsrcrecordid>eNrjZNAMyMgvyc9NLM5WSMxLUUhLTCrKTE4syczPU8hNLcnIT1EoyUgtSk3LL-JhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfEh4Z7mRqaGlkZOTsZEKAEA0y8o-Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Photomask and fabrication method therefor</title><source>esp@cenet</source><creator>YANG, MIN-AN ; WEI, SHAOI ; CHANG, HAO-MING ; HSU, SHENGANG ; LAI, CHIEN-HUNG ; LIN, CHENG-MING ; CHU, YUANIH ; WANG, HSUAN-WEN</creator><creatorcontrib>YANG, MIN-AN ; WEI, SHAOI ; CHANG, HAO-MING ; HSU, SHENGANG ; LAI, CHIEN-HUNG ; LIN, CHENG-MING ; CHU, YUANIH ; WANG, HSUAN-WEN</creatorcontrib><description>A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210421&DB=EPODOC&CC=TW&NR=I725192B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210421&DB=EPODOC&CC=TW&NR=I725192B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANG, MIN-AN</creatorcontrib><creatorcontrib>WEI, SHAOI</creatorcontrib><creatorcontrib>CHANG, HAO-MING</creatorcontrib><creatorcontrib>HSU, SHENGANG</creatorcontrib><creatorcontrib>LAI, CHIEN-HUNG</creatorcontrib><creatorcontrib>LIN, CHENG-MING</creatorcontrib><creatorcontrib>CHU, YUANIH</creatorcontrib><creatorcontrib>WANG, HSUAN-WEN</creatorcontrib><title>Photomask and fabrication method therefor</title><description>A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAMyMgvyc9NLM5WSMxLUUhLTCrKTE4syczPU8hNLcnIT1EoyUgtSk3LL-JhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfEh4Z7mRqaGlkZOTsZEKAEA0y8o-Q</recordid><startdate>20210421</startdate><enddate>20210421</enddate><creator>YANG, MIN-AN</creator><creator>WEI, SHAOI</creator><creator>CHANG, HAO-MING</creator><creator>HSU, SHENGANG</creator><creator>LAI, CHIEN-HUNG</creator><creator>LIN, CHENG-MING</creator><creator>CHU, YUANIH</creator><creator>WANG, HSUAN-WEN</creator><scope>EVB</scope></search><sort><creationdate>20210421</creationdate><title>Photomask and fabrication method therefor</title><author>YANG, MIN-AN ; WEI, SHAOI ; CHANG, HAO-MING ; HSU, SHENGANG ; LAI, CHIEN-HUNG ; LIN, CHENG-MING ; CHU, YUANIH ; WANG, HSUAN-WEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI725192BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>YANG, MIN-AN</creatorcontrib><creatorcontrib>WEI, SHAOI</creatorcontrib><creatorcontrib>CHANG, HAO-MING</creatorcontrib><creatorcontrib>HSU, SHENGANG</creatorcontrib><creatorcontrib>LAI, CHIEN-HUNG</creatorcontrib><creatorcontrib>LIN, CHENG-MING</creatorcontrib><creatorcontrib>CHU, YUANIH</creatorcontrib><creatorcontrib>WANG, HSUAN-WEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANG, MIN-AN</au><au>WEI, SHAOI</au><au>CHANG, HAO-MING</au><au>HSU, SHENGANG</au><au>LAI, CHIEN-HUNG</au><au>LIN, CHENG-MING</au><au>CHU, YUANIH</au><au>WANG, HSUAN-WEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photomask and fabrication method therefor</title><date>2021-04-21</date><risdate>2021</risdate><abstract>A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TWI725192BB |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Photomask and fabrication method therefor |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T06%3A49%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YANG,%20MIN-AN&rft.date=2021-04-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI725192BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |