Pellicle attachment apparatus
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the pattern...
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| creator | LOOS, MICHEL KRAMER, RONALD HARM GUNTHER VAN DER MEULEN, FRITS DE KLERK, ANGELO CESAR PETER KRUIZINGA, MATTHIAS DINGS, JACOBUS MARIA VAN LOO, JEROME FRANCOIS SYLVAIN VIRGILE AZEREDO LIMA, JORGE MANUEL JANSEN, MAARTEN MATHIJS MARINUS KESTERS, MARTINUS JOZEF MARIA LEENDERS, MARTINUS HENDRIKUS ANTONIUS KERSTENS, ROLAND JACOBUS JOHANNES BRUIJN, MARC VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN LOOPSTRA, ERIK ROELOF THEUERZEIT, FRANK JOHANNES CHRISTIAAN LANSBERGEN, ROBERT GABRIEL MARIA MIDDEL, GEERT DEKKERS, JEROEN VAN DEN BOSCH, GERRIT BROUNS, DERK SERVATIUS GERTRUDA VAN LIEVENOOGEN, ANNE JOHANNES WILHELMUS JANSSEN, PAUL JANSSEN, MAURICE LEONARDUS JOHANNES REIJNDERS, SILVESTER MATHEUS |
| description | A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame. |
| format | Patent |
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BRUIJN, MARC ; VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ; LOOPSTRA, ERIK ROELOF ; THEUERZEIT, FRANK JOHANNES CHRISTIAAN ; LANSBERGEN, ROBERT GABRIEL MARIA ; MIDDEL, GEERT ; DEKKERS, JEROEN ; VAN DEN BOSCH, GERRIT ; BROUNS, DERK SERVATIUS GERTRUDA ; VAN LIEVENOOGEN, ANNE JOHANNES WILHELMUS ; JANSSEN, PAUL ; JANSSEN, MAURICE LEONARDUS JOHANNES ; REIJNDERS, SILVESTER MATHEUS</creator><creatorcontrib>LOOS, MICHEL ; KRAMER, RONALD HARM GUNTHER ; VAN DER MEULEN, FRITS ; DE KLERK, ANGELO CESAR PETER ; KRUIZINGA, MATTHIAS ; DINGS, JACOBUS MARIA ; VAN LOO, JEROME FRANCOIS SYLVAIN VIRGILE ; AZEREDO LIMA, JORGE MANUEL ; JANSEN, MAARTEN MATHIJS MARINUS ; KESTERS, MARTINUS JOZEF MARIA ; LEENDERS, MARTINUS HENDRIKUS ANTONIUS ; KERSTENS, ROLAND JACOBUS JOHANNES ; BRUIJN, MARC ; VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ; LOOPSTRA, ERIK ROELOF ; THEUERZEIT, FRANK JOHANNES CHRISTIAAN ; LANSBERGEN, ROBERT GABRIEL MARIA ; MIDDEL, GEERT ; DEKKERS, JEROEN ; VAN DEN BOSCH, GERRIT ; BROUNS, DERK SERVATIUS GERTRUDA ; VAN LIEVENOOGEN, ANNE JOHANNES WILHELMUS ; JANSSEN, PAUL ; JANSSEN, MAURICE LEONARDUS JOHANNES ; REIJNDERS, SILVESTER MATHEUS</creatorcontrib><description>A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210411&DB=EPODOC&CC=TW&NR=I724612B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210411&DB=EPODOC&CC=TW&NR=I724612B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LOOS, MICHEL</creatorcontrib><creatorcontrib>KRAMER, RONALD HARM GUNTHER</creatorcontrib><creatorcontrib>VAN DER MEULEN, FRITS</creatorcontrib><creatorcontrib>DE KLERK, ANGELO CESAR PETER</creatorcontrib><creatorcontrib>KRUIZINGA, MATTHIAS</creatorcontrib><creatorcontrib>DINGS, JACOBUS MARIA</creatorcontrib><creatorcontrib>VAN LOO, JEROME FRANCOIS SYLVAIN VIRGILE</creatorcontrib><creatorcontrib>AZEREDO LIMA, JORGE MANUEL</creatorcontrib><creatorcontrib>JANSEN, MAARTEN MATHIJS MARINUS</creatorcontrib><creatorcontrib>KESTERS, MARTINUS JOZEF MARIA</creatorcontrib><creatorcontrib>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</creatorcontrib><creatorcontrib>KERSTENS, ROLAND JACOBUS JOHANNES</creatorcontrib><creatorcontrib>BRUIJN, MARC</creatorcontrib><creatorcontrib>VERBRUGGE, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN</creatorcontrib><creatorcontrib>LOOPSTRA, ERIK ROELOF</creatorcontrib><creatorcontrib>THEUERZEIT, FRANK JOHANNES CHRISTIAAN</creatorcontrib><creatorcontrib>LANSBERGEN, ROBERT GABRIEL MARIA</creatorcontrib><creatorcontrib>MIDDEL, GEERT</creatorcontrib><creatorcontrib>DEKKERS, JEROEN</creatorcontrib><creatorcontrib>VAN DEN BOSCH, GERRIT</creatorcontrib><creatorcontrib>BROUNS, DERK SERVATIUS GERTRUDA</creatorcontrib><creatorcontrib>VAN LIEVENOOGEN, ANNE JOHANNES WILHELMUS</creatorcontrib><creatorcontrib>JANSSEN, PAUL</creatorcontrib><creatorcontrib>JANSSEN, MAURICE LEONARDUS JOHANNES</creatorcontrib><creatorcontrib>REIJNDERS, SILVESTER MATHEUS</creatorcontrib><title>Pellicle attachment apparatus</title><description>A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; 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and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Pellicle attachment apparatus |
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