Method of optimizing a mask and method of forming an integrated circuit

In some embodiments, a method may include improving a development process of a photoresist. The method may include simulating a negative-tone development process of a photoresist. The method may include determining a reaction of a developer with a soluble photoresist surface. Determining the reactio...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SMITH, MARK D, BIAFORE, JOHN J, BLANKENSHIP, DAVID A, GRAVES, JOHN S, VAGLIO PRET, ALESSANDRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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