Lithography optics adjustment and monitoring

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SUBRAMANIAN, ABHISHEK, BIBBY, THOMAS FREDERICK ALLEN JR, ROKITSKI, ROSTISLAV, DUFFEY, THOMAS PATRICK, HARAN, DONALD JAMES, ZURITA, OMAR, TAHBOUB, KHALID KHULUSI, THORNES, JOSHUA JON
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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