TWI719448B

The present invention addresses the problem of reducing the amount of processing liquid used for concentration control in a substrate processing device. This substrate processing device performs predetermined processing on a substrate by discharging a processing liquid, containing a chemical and pur...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GOHARA, TAKAYUKI, MIZUKAMI, DAIJO, ISHII, HIROAKI
Format:	Patent
Sprache:	chi
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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