Method of making composite polishing layer for chemical mechanical polishing pad

A method of forming a chemical mechanical polishing pad composite polishing layer is provided, including: providing a first polishing layer component of a first continuous non-fugitive polymeric phase having a plurality of periodic recesses; discharging a combination toward the first polishing layer...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BRUGAROLAS BRUFAU, TERESA, LUGO, DIEGO, QIAN, BAINIAN, VENEZIALE, DAVID MICHAEL, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN, TONG, YUHUA, JACOB, GEORGE C, KOZHUKH, JULIA, MILLER, JEFFREY B, WANK, ANDREW, STACK, MARC R
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL PROCESSES OF COMPOUNDING GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS POLISHING THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP
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