Ultrasonic frequency adjusting device for ultrasonic processing apparatus

An ultrasonic frequency adjusting device for an ultrasonic processing apparatus is provided. The ultrasonic frequency adjusting device includes a power, an ultrasonic control module and a processor. An ultrasonic processing unit of ultrasonic control module is configured to generate an ultrasonic ba...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CHEN, HAO-WEI, SHIH, CHUN MING, CHEN, KUANN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator CHEN, HAO-WEI
SHIH, CHUN MING
CHEN, KUANN
description An ultrasonic frequency adjusting device for an ultrasonic processing apparatus is provided. The ultrasonic frequency adjusting device includes a power, an ultrasonic control module and a processor. An ultrasonic processing unit of ultrasonic control module is configured to generate an ultrasonic based on a first power from the power and to apply the ultrasonic to a processing element. An ultrasonic frequency adjusting unit of the ultrasonic control module is configured to adjust an operating frequency of the ultrasonic. The processor is configured to determine that voltage and current of the first power has a characterized phase while the operating frequency is adjusted to a first frequency. The processor is further configured to control the ultrasonic frequency adjusting unit for adjusting the operating frequency of the ultrasonic to the first frequency.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI716699BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI716699BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI716699BB3</originalsourceid><addsrcrecordid>eNrjZPAMzSkpSizOz8tMVkgrSi0sTc1LrlRITMkqLS7JzEtXSEkty0xOVUjLL1IoRagsKMpPTi0uBilILChILEosKS3mYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxIeGe5oZmZpaWTk7GRCgBABn4Ng4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Ultrasonic frequency adjusting device for ultrasonic processing apparatus</title><source>esp@cenet</source><creator>CHEN, HAO-WEI ; SHIH, CHUN MING ; CHEN, KUANN</creator><creatorcontrib>CHEN, HAO-WEI ; SHIH, CHUN MING ; CHEN, KUANN</creatorcontrib><description>An ultrasonic frequency adjusting device for an ultrasonic processing apparatus is provided. The ultrasonic frequency adjusting device includes a power, an ultrasonic control module and a processor. An ultrasonic processing unit of ultrasonic control module is configured to generate an ultrasonic based on a first power from the power and to apply the ultrasonic to a processing element. An ultrasonic frequency adjusting unit of the ultrasonic control module is configured to adjust an operating frequency of the ultrasonic. The processor is configured to determine that voltage and current of the first power has a characterized phase while the operating frequency is adjusted to a first frequency. The processor is further configured to control the ultrasonic frequency adjusting unit for adjusting the operating frequency of the ultrasonic to the first frequency.</description><language>chi ; eng</language><subject>CONTROLLING ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; PHYSICS ; POLISHING ; REGULATING ; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES ; TRANSPORTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210121&amp;DB=EPODOC&amp;CC=TW&amp;NR=I716699B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210121&amp;DB=EPODOC&amp;CC=TW&amp;NR=I716699B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHEN, HAO-WEI</creatorcontrib><creatorcontrib>SHIH, CHUN MING</creatorcontrib><creatorcontrib>CHEN, KUANN</creatorcontrib><title>Ultrasonic frequency adjusting device for ultrasonic processing apparatus</title><description>An ultrasonic frequency adjusting device for an ultrasonic processing apparatus is provided. The ultrasonic frequency adjusting device includes a power, an ultrasonic control module and a processor. An ultrasonic processing unit of ultrasonic control module is configured to generate an ultrasonic based on a first power from the power and to apply the ultrasonic to a processing element. An ultrasonic frequency adjusting unit of the ultrasonic control module is configured to adjust an operating frequency of the ultrasonic. The processor is configured to determine that voltage and current of the first power has a characterized phase while the operating frequency is adjusted to a first frequency. The processor is further configured to control the ultrasonic frequency adjusting unit for adjusting the operating frequency of the ultrasonic to the first frequency.</description><subject>CONTROLLING</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>POLISHING</subject><subject>REGULATING</subject><subject>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAMzSkpSizOz8tMVkgrSi0sTc1LrlRITMkqLS7JzEtXSEkty0xOVUjLL1IoRagsKMpPTi0uBilILChILEosKS3mYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxIeGe5oZmZpaWTk7GRCgBABn4Ng4</recordid><startdate>20210121</startdate><enddate>20210121</enddate><creator>CHEN, HAO-WEI</creator><creator>SHIH, CHUN MING</creator><creator>CHEN, KUANN</creator><scope>EVB</scope></search><sort><creationdate>20210121</creationdate><title>Ultrasonic frequency adjusting device for ultrasonic processing apparatus</title><author>CHEN, HAO-WEI ; SHIH, CHUN MING ; CHEN, KUANN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI716699BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>CONTROLLING</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>POLISHING</topic><topic>REGULATING</topic><topic>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>CHEN, HAO-WEI</creatorcontrib><creatorcontrib>SHIH, CHUN MING</creatorcontrib><creatorcontrib>CHEN, KUANN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHEN, HAO-WEI</au><au>SHIH, CHUN MING</au><au>CHEN, KUANN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Ultrasonic frequency adjusting device for ultrasonic processing apparatus</title><date>2021-01-21</date><risdate>2021</risdate><abstract>An ultrasonic frequency adjusting device for an ultrasonic processing apparatus is provided. The ultrasonic frequency adjusting device includes a power, an ultrasonic control module and a processor. An ultrasonic processing unit of ultrasonic control module is configured to generate an ultrasonic based on a first power from the power and to apply the ultrasonic to a processing element. An ultrasonic frequency adjusting unit of the ultrasonic control module is configured to adjust an operating frequency of the ultrasonic. The processor is configured to determine that voltage and current of the first power has a characterized phase while the operating frequency is adjusted to a first frequency. The processor is further configured to control the ultrasonic frequency adjusting unit for adjusting the operating frequency of the ultrasonic to the first frequency.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_TWI716699BB
source esp@cenet
subjects CONTROLLING
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
PHYSICS
POLISHING
REGULATING
SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
TRANSPORTING
title Ultrasonic frequency adjusting device for ultrasonic processing apparatus
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T05%3A53%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHEN,%20HAO-WEI&rft.date=2021-01-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI716699BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true