Apparatus for preparing aqueous resist stripping liquid and apparatus for preparing non-aqueous resist stripping liquid
An objective of the present invention is to provide an aqueous resist stripper preparing apparatus and a non-aqueous resist stripper preparing apparatus which can prepare a resist stripper with predetermined component concentrations from raw materials of the resist stripper accurately, automatically...
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creator | NAKAGAWA, TOSHIMOTO |
description | An objective of the present invention is to provide an aqueous resist stripper preparing apparatus and a non-aqueous resist stripper preparing apparatus which can prepare a resist stripper with predetermined component concentrations from raw materials of the resist stripper accurately, automatically, and continuously. To achieve the objective, the aqueous resist stripper preparing apparatus (10) comprises a preparation tank (3), a measuring unit (2), and a control unit (1). The preparation tank (3) receives and mixes the raw materials of the resist stripper. The measuring unit (2) measures at least one of physical property values of the resist stripper having a correlation with the component concentrations of the resist stripper and component concentrations of the resist stripper with respect to the resist stripper within the preparation tank (3). The control unit (1) controls a supply amount of the raw materials of the resist stripper supplied to the preparation tank (3) such that the resist stripper prepare |
format | Patent |
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To achieve the objective, the aqueous resist stripper preparing apparatus (10) comprises a preparation tank (3), a measuring unit (2), and a control unit (1). The preparation tank (3) receives and mixes the raw materials of the resist stripper. The measuring unit (2) measures at least one of physical property values of the resist stripper having a correlation with the component concentrations of the resist stripper and component concentrations of the resist stripper with respect to the resist stripper within the preparation tank (3). The control unit (1) controls a supply amount of the raw materials of the resist stripper supplied to the preparation tank (3) such that the resist stripper prepare</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PHYSICS ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200421&DB=EPODOC&CC=TW&NR=I691811B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200421&DB=EPODOC&CC=TW&NR=I691811B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKAGAWA, TOSHIMOTO</creatorcontrib><title>Apparatus for preparing aqueous resist stripping liquid and apparatus for preparing non-aqueous resist stripping liquid</title><description>An objective of the present invention is to provide an aqueous resist stripper preparing apparatus and a non-aqueous resist stripper preparing apparatus which can prepare a resist stripper with predetermined component concentrations from raw materials of the resist stripper accurately, automatically, and continuously. To achieve the objective, the aqueous resist stripper preparing apparatus (10) comprises a preparation tank (3), a measuring unit (2), and a control unit (1). The preparation tank (3) receives and mixes the raw materials of the resist stripper. The measuring unit (2) measures at least one of physical property values of the resist stripper having a correlation with the component concentrations of the resist stripper and component concentrations of the resist stripper with respect to the resist stripper within the preparation tank (3). 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To achieve the objective, the aqueous resist stripper preparing apparatus (10) comprises a preparation tank (3), a measuring unit (2), and a control unit (1). The preparation tank (3) receives and mixes the raw materials of the resist stripper. The measuring unit (2) measures at least one of physical property values of the resist stripper having a correlation with the component concentrations of the resist stripper and component concentrations of the resist stripper with respect to the resist stripper within the preparation tank (3). The control unit (1) controls a supply amount of the raw materials of the resist stripper supplied to the preparation tank (3) such that the resist stripper prepare</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS TRANSPORTING |
title | Apparatus for preparing aqueous resist stripping liquid and apparatus for preparing non-aqueous resist stripping liquid |
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